Nodira Mustafoeva1, Allanazar Tashatov2, Bünyamin Sahin3 (2026) “STUDY OF THE EFFECT OF Ni⁺ ION IMPLANTATION ON THE NEAR-SURFACE LAYERS OF SILICON USING MODERN ANALYSIS METHODS”, International Multidisciplinary Journal for Research & Development, 13(03), pp. 735–737. Available at: https://ijmrd.in/index.php/imjrd/article/view/5411 (Accessed: 5 April 2026).